Influence of oxygen partial pressure on the metastable copper oxide thin films


Gecici B., KORKMAZ Ş., ÖZEN S. , Senay V., PAT S.

MODERN PHYSICS LETTERS B, vol.30, no.35, 2016 (Journal Indexed in SCI) identifier identifier

  • Publication Type: Article / Review
  • Volume: 30 Issue: 35
  • Publication Date: 2016
  • Doi Number: 10.1142/s0217984915300124
  • Title of Journal : MODERN PHYSICS LETTERS B

Abstract

Paramelaconite (Cu4O3) is a metastable copper oxide. Metastable copper oxide thin films were deposited on glass substrates by reactive RF magnetron sputtering in argon (Ar) and oxygen (O-2) gas mixture atmospheres. Ar/O-2 gas ratios in the sputtering ambient were chosen as 1/1 and 1/9. The surface and optical properties were determined by X-ray diffractometer (XRD), atomic force microscope (AFM) and UV-Vis spectrophotometer. The XRD patterns of the samples exhibited single strong diffraction peaks at 35.39 degrees and 35.49 degrees, corresponding to the (202) peak of Cu4O3. The mean thickness values were measured as 100 nm and 80 nm for the films deposited at 1/1 and 1/9 Ar/O-2 gas ratios, respectively. The samples showed low transmittance and high absorbance in the high frequency region.