Cubic BN thin film deposition by a RF magnetron sputtering


PAT S., Silik E., Musaoglu C., ÖZEN S. , Mohammadigharehbagh R., Yudar H. H. , ...More

VACUUM, vol.157, pp.31-35, 2018 (Journal Indexed in SCI) identifier identifier

  • Publication Type: Article / Article
  • Volume: 157
  • Publication Date: 2018
  • Doi Number: 10.1016/j.vacuum.2018.08.027
  • Title of Journal : VACUUM
  • Page Numbers: pp.31-35

Abstract

The BN thin film is only one option for the high temperature application instead of the diamond like carbon coatings. Cubic form BN thin film is hard. The friction coefficient is also very low in hexagonal form. An alternative method for the BN coating is RF magnetron sputtering system. In this paper, BN thin films were deposited by RF magnetron sputtering. The film thickness changed in the range of 20-120 nm. In XRD patterns, 2 theta values of 29.48 degrees (143), 44.61 degrees (400) which exhibits the phase of the e-BN and 41.86 degrees (100), 39.80 degrees (010) indicates the phase of h-BN crystals. The smallest crystallites sizes were calculated as to be 12 nm and biggest crystallites sizes ere calculated as to be 66 nm. A strong Raman peak at approximately 1086 cm(-1) were measured, correspond the cubic phase of BN. According to the Raman spectra, pure c-BN thin films were deposited.