On the energy distribution of interface states and their relaxation time and capture cross section profiles in Al/SiO2/P-Si (MIS) Schottky diodes

ALTINDAL Ş., Kanbur H., Yuecedag I., TATAROĞLU A.

MICROELECTRONIC ENGINEERING, vol.85, no.7, pp.1495-1501, 2008 (SCI-Expanded) identifier identifier

  • Publication Type: Article / Article
  • Volume: 85 Issue: 7
  • Publication Date: 2008
  • Doi Number: 10.1016/j.mee.2008.02.001
  • Journal Indexes: Science Citation Index Expanded (SCI-EXPANDED), Scopus
  • Page Numbers: pp.1495-1501
  • Keywords: interface states, relaxation time, capture cross section, high-low frequency, capacitance method, conductance method, insulator layer, SI-SIO2 INTERFACE, CONDUCTANCE TECHNIQUE, ELECTRICAL CHARACTERIZATION, CAPACITANCE MEASUREMENTS, SERIES RESISTANCE, SI/AL CONTACTS, MOS STRUCTURES, TUNNEL-DIODES, THIN OXIDES, C-V
  • Yozgat Bozok University Affiliated: Yes


The energy distribution profile of the interface states (N-ss) and their relaxation time (tau) and capture cross section (sigma(p)) of metal-insulator-semiconductor (Al/SiO2/p-Si) Schottky diodes have been investigated by using the high-low frequency capacitance and conductance methods. The capacitance-voltage (C-V) and conductance-voltage (G/w-V) characteristics of these devices were investigated by considering series resistance (R-s) effects in a wide frequency range (5 kHz-1 MHz.). It is shown that the capacitance of the Al/SiO2/p-Si Schottky diode decreases with increasing frequency. The increase in capacitance especially at low frequencies results form the presence of interface states at Si/SiO2 interface. The energy distributions of the interface states and their relaxation time have been determined in the energy range of (0.362-E-v)-(0.512-E-v) eV by taking into account the surface potential as a function of applied bias obtained from the measurable C-V curve (500 Hz) at the lowest frequency. The values of the interface state density (N-ss) ranges from 2.34 x 10(12) to 2.91 x 10(12) eV(-1)/cm(2), and the relaxation time (tau) ranges from 1.05 x 10(-6) to 1.58 x 10(-4) s, Showing all exponential rise with bias from the top of the valance band towards the mid-gap. (C) 2008 Elsevier B.V. All rights reserved.